Electrostatic Chucks

Highly plasma-resistant chucks perform well in a wide range of operating temperatures.

A ceramic electrostatic chucks which are widely used for semiconductor wafer processing such as etching and CVD equipment.
We offers high quality, low cost, short lead time and manufactures using consistent production processes such as firing and machining of ceramic, assembly and inspection.

An internal electrode is embedded to utilize the electrostatic force generated between this structure and the Si wafer placed on the ESC surface. This product is used for silicon wafer mounting, flatness correction and cooling the silicon wafer during the semiconductor manufacturing process.