J.A Systems NEO Sputter is optimized Cathode design system can provide high efficiency on thin film coating.
Various gas and precise control process are available by adapting Throttle Valve.
RF & DC power control, co-deposition, and even multi layer coating are available by simple equipment control.
Simple and Compact design, easy and user friendly interface can save customers' time and cost.
J.A System NEO sputtering system will be your best choice forever.

Specification

Sputtering gun | 2 inch Deposition direction I Downward
Substrate type I Glass & Wafer
Substrate size I Up to 2 inch
Substrate heater temperature IR lamp 900^C, Mold Heater 850°C Process gas I Ar (02, N2 optional)

Choices and options

Power | DC 1KW & RF 300W
Heater I Lamp or Mold
Frame I Stand type or cabinet type

Special Features

RF or DC magnetron sputter for multipurpose R&D RF to DC power supply easily changed without Hardware change
Deposition available for various materials of metals, carbon materials, metal oxides and metal nitrides, etc. Small space needed for installation
Efficient deposition through easy operation High performance to low cost
Ar gas introduced between cathode shield and target for high sputter yield. Reactive sputtering also available

Applications

Applicable to various R&D fields that sputter deposition of metals and ceramic materials necessary
Application areas I semiconductor, display, solar cell, biochips, New rnaterials, nanomaterials, and sample preparations, etc.