【Product Description】

Synopex CMP Cartridge Filter has been developed for the CMP process (Chemical
Mechanical Polishing) of semiconductor manufacturing process. This filter product has
been designed to remove large particles which might generate defect (scratch) on the
wafer surface by passing working slurry particles through. Especially, it has a gradient
structure of multi-layer which can remove different size of particles by each layer to reduce
the initial blockage in the filter and thus to improve the long life span of filter.

Major Characteristics

• Expanded Slurry Life and Supplying Constant Slurry flow

• Remove Large Particles which cause Damage on the Wafer Surface.

• Possible for high Flow Rate with Wide Filter Surface Area.

• Multi Layer Gradient (Gradient Structure)

• Pure Polypropylene Material without adhesives or organic binders

Product specifications

Outer Diameter(㎜) : 69.5

Length: 10”(254㎜), 20”(508㎜), 30”(762㎜)

SPCMPA: 0.2, 2, 4.5, 10㎛

SPCMPN: 1, 3㎛

SPCMPDN: 0.2㎛

Filtration Materials: Polypropylene

Support & Drain layer : Polypropylene